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Atomic layer deposition of HfO2, Al2O3, and HfAlOx using O3 and metal(diethylamino) precursors

✍ Scribed by Katamreddy, Rajesh; Inman, Ronald; Jursich, Gregory; Soulet, Axel; Takoudis, Christos

No coin nor oath required. For personal study only.

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