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Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma

✍ Scribed by Huang, Li-Tien; Chang, Ming-Lun; Huang, Jhih-Jie; Lin, Hsin-Chih; Kuo, Chin-Lung; Lee, Min-Hung; Liu, Chee Wee; Chen, Miin-Jang

No coin nor oath required. For personal study only.

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