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Electrical and physical characterization of remote plasma oxidized HfO2 gate dielectrics

✍ Scribed by Yamamoto, K.; Deweerd, W.; Aoulaiche, M.; Houssa, M.; De Gendt, S.; Horii, S.; Asai, M.; Sano, A.; Hayashi, S.; Niwa, M.

Book ID: 114618230
Publisher: IEEE
Year: 2006
Tongue: English
Weight: 529 KB
Volume: 53
Category: Article
ISSN: 0018-9383
DOI: 10.1109/ted.2006.872090

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