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Electrical and structural characterization of PLD grown CeO2–HfO2 laminated high-k gate dielectrics

✍ Scribed by K. Karakaya; B. Barcones; Z.M. Rittersma; J.G.M. van Berkum; M.A. Verheijen; G. Rijnders; D.H.A. Blank

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
450 KB
Volume
9
Category
Article
ISSN
1369-8001

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