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Physical and electrical characterization of polysilicon vs. TiN gate electrodes for HfO2 transistors

✍ Scribed by Patrick S. Lysaght; Jeff J. Peterson; Brendan Foran; Chadwin D. Young; Gennadi Bersuker; Howard R. Huff


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
511 KB
Volume
7
Category
Article
ISSN
1369-8001

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