𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Improved tungsten absorber technology for sub-half-micron x-ray lithography

✍ Scribed by H. Luethje; M. Harms; A. Bruns; U. Mackens

Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
356 KB
Volume
6
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Sub-half micrometer gate lift-off by thr
Sub-half micrometer gate lift-off by three layer resist process via electron beam lithography for gallium arsenide monolithic microwave integrated circuits (MIMICs) : R M NAGARAJAN, S D RASK, M R KING, T K YARD (Gallium Arsenide Components Group, Unisys Corp., Eagan, MN, USA) Proc. SPIE β€” Int. Soc. Opt. Eng. (USA), vol. 923, pp. 194–200 (1988). (Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VII, Santa Clara, CA, USA, 2–4 March 1988)
πŸ“‚ Article πŸ“… 1989 πŸ› Elsevier Science 🌐 English βš– 103 KB