Investigation of the process latitude for sub-half-micron pattern replication in X-ray lithography

✍ Scribed by H.K. Oertel; M. Weiβ; H.-L. Huber

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 330 KB
• Volume: 13
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90107-o