X-ray mask technology: Low-stress tungsten deposition and sub-half-micron absorber fabrication by single-layer resist

✍ Scribed by K. Suzuki; Y. Shinizu

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 381 KB
• Volume: 14
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90006-y