X-ray mask technology: Low stress tungsten deposition and sub-half-micron absorber fabrication by single-layer resist

✍ Scribed by K. Suzuki; Y. Shimizu

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 310 KB
• Volume: 13
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90087-t