✦ LIBER ✦

X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features

✍ Scribed by H. Lüthje; A. Bruns; H. Harms; I. Köhler; U. Mescheder; U. Mackens; T. Stuck

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Improved tungsten absorber technology fo

✍ H. Luethje; M. Harms; A. Bruns; U. Mackens 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 356 KB

X-ray mask technology: Low-stress tungst

✍ K. Suzuki; Y. Shinizu 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 381 KB

X-ray mask technology: Low stress tungst

✍ K. Suzuki; Y. Shimizu 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 310 KB