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Impact of implantation on the properties of N2O-nitrided oxides of p+- and n+-gate MOS devices

✍ Scribed by O.V. Naumova; B.I. Fomin; N.V. Sakharova; M.A. Ilnitsky; V.P. Popov


Book ID
108224467
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
213 KB
Volume
267
Category
Article
ISSN
0168-583X

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