✦ LIBER ✦
Influence of implantation dose on the charge storage characteristics of MOS memory devices with low energy Si implanted gate oxides
✍ Scribed by E. Kapetanakis; P. Normand; D. Tsoukalas; K. Beltsios
- Book ID
- 114155417
- Publisher
- Elsevier Science
- Year
- 2002
- Tongue
- English
- Weight
- 136 KB
- Volume
- 61-62
- Category
- Article
- ISSN
- 0167-9317
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