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Thickness dependence of boron penetration through O2 and N2O-grown gate oxides and its impact on threshold voltage variation

✍ Scribed by Krisch, K.S.; Green, M.L.; Baumann, F.H.; Brasen, D.; Feldman, L.C.; Manchanda, L.


Book ID
111683787
Publisher
IEEE
Year
1996
Tongue
English
Weight
997 KB
Volume
43
Category
Article
ISSN
0018-9383

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