✦ LIBER ✦
Enhanced reliability for low-temperature gate dielectric of MOS devices by N2O or NO plasma nitridation
✍ Scribed by David C.T. Or; P.T. Lai; J.K.O. Sin; P.C.K. Kwok; J.P. Xu
- Book ID
- 108361943
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 115 KB
- Volume
- 43
- Category
- Article
- ISSN
- 0026-2714
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