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A novel technique of N2O-treatment on NH3-nitrided oxide as gate dielectric for nMOS transistors

โœ Scribed by Zeng, X.; Lai, P.T.; Ng, W.T.

Book ID
114536613
Publisher
IEEE
Year
1996
Tongue
English
Weight
726 KB
Volume
43
Category
Article
ISSN
0018-9383

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