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[IEEE Seventh International IEEE Conference on VLSI Multilevel Interconnection - Santa Clara, CA, USA (12-13 June 1990)] Seventh International IEEE Conference on VLSI Multilevel Interconnection - The effect of CVD W/TiW metallization on very shallow CoSi/sub 2/ junctions

✍ Scribed by Eshraghi, S.A.; Georgiou, G.E.; Liu, R.

Book ID: 121859492
Publisher: IEEE
Year: 1990
Weight: 274 KB
Category: Article
DOI: 10.1109/VMIC.1990.127884

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