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[IEEE Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Kyoto, Japan (June 14-16, 2005)] Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - High capacitance density (< 17 fF/μm/sup 2/) Nb/sub 2/O/sub 5/-based mim capacitors for future RF IC applications

✍ Scribed by Sun-Jung Kim, ; Byung Jin Cho, ; Yu, M.B.; Li, M.-F.; Xiong, Y.-Z.; Zhu, C.; Chin, A.; Kwong, D.-L.

Book ID: 121851090
Publisher: IEEE
Year: 2005
Tongue: Japanese
Weight: 465 KB
Category: Article
ISBN-13: 9784900784000
DOI: 10.1109/.2005.1469210

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