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[IEEE 2012 12th International Workshop on Junction Technology (IWJT) - Shanghai (2012.05.14-2012.05.15)] 2012 12th International Workshop on Junction Technology - Phosphorous transient enhanced diffusion suppression with cluster carbon co-implantation at low temperature

✍ Scribed by Nakashima, Y.; Hamamoto, N.; Nagayama, T.; Koga, Y.; Umisedo, S.; Hashimoto, M.; Onoda, H.

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