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[IEEE 2012 12th International Workshop on Junction Technology (IWJT) - Shanghai (2012.05.14-2012.05.15)] 2012 12th International Workshop on Junction Technology - Epitaxial growth and properties of NiSiGe

✍ Scribed by Bo Zhang, ; Wenjie Yu, ; Qingtai Zhao, ; Mussler, G.; Buca, D.; Hollander, B.; Mantl, S.; Miao Zhang,

Book ID: 118003177
Publisher: IEEE
Year: 2012
Weight: 670 KB
Category: Article
ISBN: 1467312568
DOI: 10.1109/iwjt.2012.6212841

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