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[IEEE 2012 12th International Workshop on Junction Technology (IWJT) - Shanghai (2012.05.14-2012.05.15)] 2012 12th International Workshop on Junction Technology - Hole mobility enhancement of quantum-well p-MOSFETs on sSi/sSi0.5Ge0.5/sSOI heterostructure

✍ Scribed by Yu, W.; Zhang, B.; Zhao, Q. T.; Buca, D.; Wang, X.; Mantl, S.

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