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[IEEE 2009 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - San Diego, CA, USA (2009.09.9-2009.09.11)] 2009 International Conference on Simulation of Semiconductor Processes and Devices - A Gradient-Based Inverse Lithography Technology for Double-Dipole Lithography

✍ Scribed by Xiong, Wei; Zhang, Jinyu; Wang, Yan; Yu, Zhiping; Tsai, Min-Chun

Book ID: 126914443
Publisher: IEEE
Year: 2009
Weight: 402 KB
Category: Article
DOI: 10.1109/sispad.2009.5290237

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