✦ LIBER ✦

[IEEE 2008 Symposium on VLSI Technology - Honolulu, HI, USA (2008.06.17-2008.06.19)] 2008 Symposium on VLSI Technology - Design and demonstration of very high-k (k∼50) HfO2 for ultra-scaled Si CMOS

✍ Scribed by Migita, S.; Watanabe, Y.; Ota, H.; Ito, H.; Kamimuta, Y.; Nabatame, T.; Toriumi, A.

No coin nor oath required. For personal study only.

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