[IEEE 2008 Symposium on VLSI Technology - Honolulu, HI, USA (2008.06.17-2008.06.19)] 2008 Symposium on VLSI Technology - FinFET performance advantage at 22nm: An AC perspective

✍ Scribed by Guillorn, M.; Chang, J.; Bryant, A.; Fuller, N.; Dokumaci, O.; Wang, X.; Newbury, J.; Babich, K.; Ott, J.; Haran, B.; Yu, R.; Lavoie, C.; Klaus, D.; Zhang, Y.; Sikorski, E.; Graham, W.; To, B.; Lofaro, M.; Tornello, J.; Koli, D.; Yang, B.; Pyzyna, A.; Neumeyer, D.; Khater, M.; Yagishita, A.; Kawasaki, H.; Haensch, W.

• Book ID: 118176147
• Publisher: IEEE
• Year: 2008
• Weight: 973 KB
• Volume: 0
• Category: Article
• ISBN: 142441802X
• DOI: 10.1109/vlsit.2008.4588544