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[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Void free and low stress shallow trench isolation technology using P-SOG for sub 0.1 μm device

✍ Scribed by Jin-Hwa Heo, ; Soo-Jin Hong, ; Dong-Ho Ahn, ; Hyun-Duk Cho, ; Moon-Han Park, ; Fujihara, K.; U-In Chung, ; Yong-Chul Oh, ; Joo-Tae Moon,

Book ID: 120163938
Publisher: IEEE
Year: 2002
Weight: 256 KB
Category: Article
ISBN-13: 9780780373129
DOI: 10.1109/VLSIT.2002.1015422

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