[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Novel resist pattern transfer process for 70 nm technology node using 157-nm lithography

[IEEE 2002 Symposium on VLSI Technology

✍ Fu-Liang Yang, ; Haur-Ywh Chen, ; Fang-Cheng Chen, ; Yi-Lin Chan, ; Kuo-Nan Yang 📂 Article 📅 2002 🏛 IEEE ⚖ 301 KB

[IEEE 2002 Symposium on VLSI Technology

✍ Lutzen, J.; Birner, A.; Goldbach, M.; Gutsche, M.; Hecht, T.; Jakschik, S.; Orth 📂 Article 📅 2002 🏛 IEEE ⚖ 310 KB

[IEEE 2002 Symposium on VLSI Technology

✍ Pidin, S.; Morisaki, Y.; Sugita, Y.; Aoyama, T.; Irino, K.; Nakamura, T.; Sugii, 📂 Article 📅 2002 🏛 IEEE ⚖ 231 KB

[IEEE 2002 Symposium on VLSI Technology

✍ Rim, K.; Chu, J.; Chen, H.; Jenkins, K.A.; Kanarsky, T.; Lee, K.; Mocuta, A.; Zh 📂 Article 📅 2002 🏛 IEEE ⚖ 279 KB

[IEEE 2002 Symposium on VLSI Technology

✍ Cai, J.; Ajmera, A.; Ouyang, C.; Oldiges, P.; Steigerwalt, M.; Stein, K.; Jenkin 📂 Article 📅 2002 🏛 IEEE ⚖ 217 KB

[IEEE 2002 Symposium on VLSI Technology

✍ Rim, K.; Gusev, E.P.; D'Emic, C.; Kanarsky, T.; Chen, H.; Chu, J.; Ott, J.; Chan 📂 Article 📅 2002 🏛 IEEE ⚖ 268 KB