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[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Mobility enhancement in strained Si NMOSFETs with HfO/sub 2/ gate dielectrics

✍ Scribed by Rim, K.; Gusev, E.P.; D'Emic, C.; Kanarsky, T.; Chen, H.; Chu, J.; Ott, J.; Chan, K.; Boyd, D.; Mazzeo, V.; Lee, B.H.; Mocuta, A.; Welser, J.; Cohen, S.L.; Leong, M.; Wong, H.-S.

Book ID: 126822792
Publisher: IEEE
Year: 2002
Weight: 268 KB
Category: Article
ISBN-13: 9780780373129
DOI: 10.1109/vlsit.2002.1015368

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