𝔖 Bobbio Scriptorium
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High resolution electron beam lithography and high accuracy overlay using a modified SEM

✍ Scribed by P.B. Fischer; S.Y. Chou

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
377 KB
Volume
21
Category
Article
ISSN
0167-9317

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The production of O-and 02 by dissociative attachment to ozone has been studied as a function of electron energy (from about 0 up to about 9 eV) in a recently constructed high-resolution crossed beams apparatus combined with a quadrupole mass spectrometer. After absolute calibration of the ozone gas