Ultra-High-Resolution electron-beam lith
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Craighead, H. G.
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Article
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1985
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Wiley (John Wiley & Sons)
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English
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A conventional TEWSTEM has been used for the fabrication of -10 nm-size structures by electron-beam lithography. The electron microscope provides a versatile tool for studying the lithographic process with control of the beam energy, current, and profile combined with the ability to image both the p