𝔖 Bobbio Scriptorium

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High-throughput, high-resolution electron beam lithography : H. C. Pfeiffer, T. R. Groves and T. H. Newman. IBM J. Res. Devl. 32, 494 (1988)

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 74 KB
Volume: 29
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(89)90139-x

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📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 241 KB