Magnetron sputtering system stabilisatio
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Alexey A Fomin; Vladislav Akhmatov; Sergey V Selishchev
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Article
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1998
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Elsevier Science
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English
β 574 KB
The stabilisation of a planar magnetron sputtering system for reactive sputtering ofAlN in a gaseous mixture ofAr and highly active NH, was examined. The helical instability in the cathode plasma sheath was observed and methods for its damping were proposed. It was found that the deposition oft-axis