𝔖 Bobbio Scriptorium
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High rate sputter deposition equipment

✍ Scribed by Vacuum Technology Assoc Inc


Book ID
103458230
Publisher
Elsevier Science
Year
1974
Tongue
English
Weight
108 KB
Volume
24
Category
Article
ISSN
0042-207X

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Magnetron sputtering system stabilisatio
✍ Alexey A Fomin; Vladislav Akhmatov; Sergey V Selishchev πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 574 KB

The stabilisation of a planar magnetron sputtering system for reactive sputtering ofAlN in a gaseous mixture ofAr and highly active NH, was examined. The helical instability in the cathode plasma sheath was observed and methods for its damping were proposed. It was found that the deposition oft-axis