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High-rate deposition of photocatalytic TiO2 films by oxygen plasma assist reactive evaporation method

✍ Scribed by Tetsuya Sakai; Yuji Kuniyoshi; Wataru Aoki; Sho Ezoe; Tatsuya Endo; Yoichi Hoshi

Book ID
108289936
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
339 KB
Volume
516
Category
Article
ISSN
0040-6090

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## Abstract Titanium dioxide (TiO~2~) films are produced by inductively coupled plasma‐assisted (ICP) CVD at various H~2~ flow rates. Anatase and rutile TiO~2~ films are obtained without any external heating. The surface morphologies, structures, and deposition rates of the TiO~2~ films are strongl