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Influence of oxygen flow rate on photocatalytic TiO2films deposited by rf magnetron sputtering

โœ Scribed by A. H. Chiou; C. G. Kuo; C. H. Huang; W. F. Wu; C. P. Chou; C. Y. Hsu

Publisher
Springer US
Year
2011
Tongue
English
Weight
542 KB
Volume
23
Category
Article
ISSN
0957-4522

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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore