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High-rate deposition of nanocrystalline silicon using the expanding thermal plasma technique

โœ Scribed by W.M.M. Kessels; I.J. Houston; K. Nadir; M.C.M. van de Sanden


Book ID
116669200
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
138 KB
Volume
352
Category
Article
ISSN
0022-3093

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