✦ LIBER ✦
High rate (∼3 nm/s) deposition of dense silicon nitride films at low substrate temperatures (<150 °C) using the expanding thermal plasma and substrate biasing
✍ Scribed by F.J.H. van Assche; W.M.M. Kessels; R. Vangheluwe; W.S. Mischke; M. Evers; M.C.M. van de Sanden
- Book ID
- 108287813
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 312 KB
- Volume
- 484
- Category
- Article
- ISSN
- 0040-6090
No coin nor oath required. For personal study only.