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High rate deposition of microcrystalline silicon films using jet-type inductively coupled plasma chemical vapor deposition

โœ Scribed by Zewen Zuo; Yu Wang; Jin Lu; Junzhuan Wang; Lin Pu; Yi Shi; Youdou Zheng

Book ID
113940810
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
967 KB
Volume
86
Category
Article
ISSN
0042-207X

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