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High-density inductively coupled plasma chemical vapor deposition of silicon nitride for solar cell application

✍ Scribed by I.O Parm; K Kim; D.G Lim; J.H Lee; J.H Heo; J Kim; D.S Kim; S.H Lee; J Yi

Book ID: 108472353
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 249 KB
Volume: 74
Category: Article
ISSN: 0927-0248
DOI: 10.1016/s0927-0248(02)00053-3

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