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Silicon nitride films prepared by high-density plasma chemical vapor deposition for solar cell applications

✍ Scribed by S.H. Lee; I. Lee; J. Yi

Book ID: 108422986
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 335 KB
Volume: 153
Category: Article
ISSN: 0257-8972
DOI: 10.1016/s0257-8972(01)01554-7

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