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Low temperature deposition of tin oxide films by inductively coupled plasma assisted chemical vapor deposition

✍ Scribed by H.Y. Lee; J.N. Kim; Hun Kim; D.S. Jang; J.J. Lee

Book ID
108289899
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
654 KB
Volume
516
Category
Article
ISSN
0040-6090

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