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Pitting resistance of TiN deposited on Inconel 600 by plasma-assisted chemical vapor deposition

✍ Scribed by C.B. In; S.P. Kim; Y.I. Kim; W.W. Kim; I.H. Kuk; S.S Chun; W.J. Lee

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 833 KB
Volume: 211
Category: Article
ISSN: 0022-3115
DOI: 10.1016/0022-3115(94)90350-6

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