High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma

✍ Scribed by F. Liao; S. Park; J.M. Larson; M.R. Zachariah; S.L. Girshick

• Book ID: 117357346
• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 255 KB
• Volume: 57
• Category: Article
• ISSN: 0167-577X
• DOI: 10.1016/s0167-577x(02)01116-3