✦ LIBER ✦

Crystal Growth Technology || High-Rate Deposition of Amorphous Silicon Films by Atmospheric-Pressure Plasma Chemical Vapor Deposition

✍ Scribed by Scheel, Hans J.; Fukuda, Tsuguo

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Crystallization of amorphous silicon–ger

✍ D Guillet; M Sarret; L Haji; R Rogel; O Bonnaud 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 161 KB

Growth of Single-Crystal Pyrite Films by

✍ Takahashi, Naoyuki; Nakatani, Yusuke; Yatomi, Takuma; Nakamura, Takato 📂 Article 📅 2003 🏛 American Chemical Society 🌐 English ⚖ 59 KB

Chemical and morphological properties of

✍ W.L. Scopel; R.R. Cuzinatto; M.H. Tabacniks; M.C.A. Fantini; M.I. Alayo; I. Pere 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 616 KB

Ammonia-free deposition of silicon nitri

✍ Inayoshi, Y.; Murashige, S.; Suemitsu, M.; Nakajima, S.; Uehara, T.; Toyoshima, 📂 Article 📅 2009 🏛 AVS (American Vacuum Society) 🌐 English ⚖ 518 KB

The growth characteristics of microcryst

✍ Kwon, Jung-Dae 📂 Article 📅 2013 🏛 The Korean Institute of Metals and Materials 🌐 English ⚖ 545 KB

Characterization of intrinsic amorphous

✍ H. Kakiuchi; M. Matsumoto; Y. Ebata; H. Ohmi; K. Yasutake; K. Yoshii; Y. Mori 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 302 KB