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Ammonia-free deposition of silicon nitride films using pulsed-plasma chemical vapor deposition under near atmospheric pressure

✍ Scribed by Inayoshi, Y.; Murashige, S.; Suemitsu, M.; Nakajima, S.; Uehara, T.; Toyoshima, Y.; Matsumoto, M.

No coin nor oath required. For personal study only.

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