✦ LIBER ✦
Low-temperature formation of silicon nitride films using pulsed-plasma CVD under near atmospheric pressure
✍ Scribed by M. Matsumoto; Y. Inayoshi; M. Suemitsu; E. Miyamoto; T. Yara; S. Nakajima; T. Uehara; Y. Toyoshima
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 337 KB
- Volume
- 254
- Category
- Article
- ISSN
- 0169-4332
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