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Effect of ammonia plasma pretreatment on the plasma enhanced chemical vapor deposited silicon nitride films

โœ Scribed by M. Bose; D.K. Basa; D.N. Bose


Book ID
117356239
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
86 KB
Volume
48
Category
Article
ISSN
0167-577X

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