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Effect of ammonia plasma treatment on plasma deposited silicon nitride films/silicon interface characteristics

✍ Scribed by Arai, Hitoshi

Book ID: 125452993
Publisher: AVS (American Vacuum Society)
Year: 1988
Tongue: English
Weight: 600 KB
Volume: 6
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.584349

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