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High-quality GaN epitaxial layer grown by metalorganic vapor phase epitaxy on (111) MgAl2O4 substrate

✍ Scribed by Kuramata, Akito; Horino, Kazuhiko; Domen, Kay; Shinohara, Kouji; Tanahashi, Toshiyuki


Book ID
120495477
Publisher
American Institute of Physics
Year
1995
Tongue
English
Weight
469 KB
Volume
67
Category
Article
ISSN
0003-6951

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Growth of GaAs and AIGaAs epitaxial layers on both (111)A and (111)B faces ofGaAs substrates was studied by the atmospheric metalorganic vapor phase epitaxy (MOVPE) technique. We show that GaAs and A1GaAs layers with excellent surface quality can be grown at relatively low temperatures and V/Ill rat