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High-quality amorphous hydrogenated silicon carbide coatings by remote plasma chemical vapor deposition from a single-source precursor

✍ Scribed by A.M. Wróbel; S. Wickramanayaka; Y. Nakanishi; Y. Hatanaka

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 339 KB
Volume: 53
Category: Article
ISSN: 0924-0136
DOI: 10.1016/0924-0136(95)02004-6

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