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High power N-face GaN high electron mobility transistors grown by molecular beam epitaxy with optimization of AlN nucleation

✍ Scribed by Wong, Man Hoi; Pei, Yi; Speck, James S.; Mishra, Umesh K.


Book ID
121368014
Publisher
American Institute of Physics
Year
2009
Tongue
English
Weight
593 KB
Volume
94
Category
Article
ISSN
0003-6951

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## Abstract Ohmic regrowth by molecular beam epitaxy (MBE) has been investigated for metal‐face InAlN/AlN/GaN high electron mobility transistors (HEMTs) for the first time. Using SiO~2~ mask n^+^‐GaN was regrown in the source/drain region while deposition on the mask was lifted off in buffered HF a