Metal-face InAlN/AlN/GaN high electron m
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Guo, Jia ;Cao, Yu ;Lian, Chuanxin ;Zimmermann, Tom ;Li, Guowang ;Verma, Jai ;Gao
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Article
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2011
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John Wiley and Sons
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English
β 307 KB
## Abstract Ohmic regrowth by molecular beam epitaxy (MBE) has been investigated for metalβface InAlN/AlN/GaN high electron mobility transistors (HEMTs) for the first time. Using SiO~2~ mask n^+^βGaN was regrown in the source/drain region while deposition on the mask was lifted off in buffered HF a