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High-Performance Metal-Insulator-Metal Capacitor Using Quality Properties of High-κ TiPrO Dielectric

✍ Scribed by Huang, Chingchien; Cheng, Chun-Hu; Lee, Ko-Tao; Liou, Bo-Heng


Book ID
121852957
Publisher
The Electrochemical Society
Year
2009
Tongue
English
Weight
341 KB
Volume
156
Category
Article
ISSN
0013-4651

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High j HfO x N y film was deposited on amorphous InGaZnO (a-IGZO) by radio-frequency reactive sputtering using an HfO 2 target in nitrogen plus argon ambience, the electrical characteristics and reliability of a-IGZO metal-insulator-semiconductor (MIS) capacitors were investigated. Experimental resu